Mr. Tae Joong Ha | Membrane | Research Excellence Award

Mr. Tae Joong Ha | Membrane | TDNJ Inc | South Korea

Mr. Tae Joong Ha is a distinguished semiconductor technology leader and applied research professional with deep expertise in photolithography processes, photomask process technology, blank mask engineering, and EUV pellicle membrane development. His educational background in metallurgical engineering provided a strong scientific foundation in materials science, thin-film processes, and advanced manufacturing, which he has successfully translated into industrial innovation. Professionally, Mr. Tae Joong Ha has accumulated extensive experience across wafer photolithography, photomask front-end processing, process integration, and large-scale semiconductor manufacturing, progressing from core process engineering roles to senior technical leadership. He currently serves as the Chief Executive Officer and Founder of TD&J Co., Ltd., where he leads strategic research, company operations, and the development of next-generation EUV pellicle membrane technologies with strong relevance to advanced semiconductor nodes. His scholarly output, while industry-focused, includes Scopus-indexed publications with verified metrics comprising 2 documents, 1 citation, and an h-index of 1, with key work disseminated through IEEE- and Scopus-indexed conference venues, including contributions to EUV pellicle membrane design.

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